1. Introduction
In semiconductor manufacturing, ultra-pure chemical cleaning is a critical step to ensure wafer surface quality and yield rate. During processes such as etching, CMP (Chemical Mechanical Polishing), and photoresist stripping, various high-purity and corrosive chemicals—like HF, HCl, H₂SO₄, and H₂O₂—are used.
To achieve leak-free, contamination-free, and stable chemical delivery, magnetic drive pumps (magnetic pumps) have become a core component in semiconductor wet process and cleaning equipment.
2. Why Magnetic Drive Pumps Are Ideal for Semiconductor Applications
(1) Leak-Free and Contamination-Free Design
Magnetic drive pumps transmit torque via magnetic coupling instead of traditional mechanical seals. This eliminates the possibility of liquid leakage, ensuring that high-purity chemicals remain uncontaminated. It’s crucial for semiconductor fabs, where even trace contamination can cause yield loss.
(2) High Chemical Resistance
The wetted parts of the pump—such as pump casing, impeller, and isolation sleeve—are often made of PFA, PVDF, PTFE, or high-purity ceramic materials, offering excellent corrosion resistance to acids and solvents used in wafer cleaning.
(3) Minimal Particle Generation
In cleanroom environments, any particle contamination can damage wafers. Magnetic drive pumps have no mechanical friction seal, reducing wear and minimizing particle generation, making them compatible with ultra-clean fluid systems.
(4) Compact and Maintenance-Free
Compared with mechanical seal pumps, magnetic drive pumps have fewer moving parts, simpler structure, and lower maintenance requirements—ideal for equipment with strict uptime and reliability standards.
3. Application Scenarios in Semiconductor Cleaning Equipment
① Wet Bench Chemical Circulation
Used for circulating and transferring chemicals such as SC-1 (NH₄OH + H₂O₂ + H₂O), SC-2 (HCl + H₂O₂ + H₂O), and HF-based cleaning agents.
→ Ensures precise flow control and prevents cross-contamination between tanks.
② Acid and Alkali Supply Systems
For the storage, transfer, and dosing of ultra-pure sulfuric acid, hydrochloric acid, and ammonia solutions.
→ Magnetic pumps made with PFA lining or all-plastic construction ensure long-term reliability.
③ Rinse and DI Water Circulation Systems
Used to pump deionized water (DI Water) in wafer rinse processes, ensuring stable flow and preventing metallic ion contamination.
④ CMP Slurry Delivery
Handles abrasive slurry with low particle generation and strong abrasion resistance.
→ Ceramic or SiC bearings are preferred for durability and chemical stability.
4. Material and Structure Selection for Semiconductor Use
| Component | Recommended Material | Feature |
|---|---|---|
| Pump casing | PFA / PVDF | High purity and corrosion resistance |
| Impeller | PTFE / Ceramic | Smooth surface, low particle shedding |
| Shaft & Bearing | SiC / Ceramic | Excellent wear resistance |
| Isolation sleeve | ETFE / CFR-ETFE | Prevents eddy current losses and leakage |
For high-purity acid transfer, PFA-lined or all-PFA magnetic pumps are the best choice. For alkaline or oxidizing agents, PVDF or PTFE pumps provide stable performance.
5. Advantages in Semiconductor Production Lines
✅ Zero leakage, protecting the cleanroom environment
✅ High purity — prevents chemical degradation or metallic ion contamination
✅ Corrosion resistance — suitable for strong acids and bases
✅ Energy efficient and silent operation
✅ Compact size, fits within integrated cleaning modules
✅ Long service life with minimal maintenance
6. Conclusion
Magnetic drive pumps play a vital role in semiconductor cleaning equipment by providing reliable, leak-free, and ultra-pure chemical transfer. With the trend toward smaller nodes and higher wafer precision, the demand for high-purity, corrosion-resistant, and low-particle pumps will continue to grow.
Choosing the right magnetic pump model and material ensures stable operation, prolonged equipment life, and improved process yield in modern semiconductor fabs.